Yugu Yang-Keathley

Assistant Professor

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Dr. Yugu Yang-Keathley is an Assistant Professor of Electrical and Computer Engineering at Wentworth Institute of Technology, Boston, MA. She received her B.S. in Microelectronic Science and Technology from University of Electronic Science and Technology of China, and Ph.D. in Electrical Engineering from University of Kentucky. Dr. Yang-Keathley’s area of expertise is micro/nano-fabrication, photolithography, and electron-beam lithography.

“Controlling Ultrafast Field Enhancement of Nanostructures via Device Geometry”, Drew Buckley, Yugu Yang-Keathley, Phillip D. Keathley, accepted to the 2019 AAAS Annual Meeting in Washington, DC

“SU-8 Exposure Dependence on the Wavelength of Ultraviolet Light Source”, Glenn Martinez, Tung Thai, Yugu Yang-Keathley, accepted to the 2019 AAAS Annual Meeting in Washington, DC

“High-Powered Dose-Controlled Photolithography System”, Owen Medeiros, Joseph Martel-Foley, Yugu Yang-Keathley, 2018 AAAS Annual Meeting, Austin, Texas

“Affordable Photolithography”, Owen Medeiros, Daniel Caraballo, Kenneth Costa, Maria Rodriguez, Joseph Martel-Foley, Phillip D. Keathley, Yugu Yang-Keathley, 2017 AAAS Annual Meeting, Boston, Massachusetts  

“Affordable Photolithography with Biomedical Applications”, Daniel Caraballo, Kenneth Costa, Maria Rodriguez, Owen Medeiros, Bernard Sidze, Joseph Martel-Foley, Phillip Keathley, Yugu Yang-Keathley, 2016 IEEE MIT Undergraduate Research Technology Conference, Cambridge, Massachusetts

“Real-time Dose Control for Electron Beam Lithography”, the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Las Vegas, Nevada, 2011.

“FPGA Implementation of Real-time Spatial-Phase Locking for Electron Beam Lithography”, Presented at the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Portland, Oregon, 2008.

“FPGA Implementation of Real-Time Spatial-Phase Locking for Electron Beam Lithography”, Y. Yang and J. T. Hastings, Journal of Vacuum Sciences & Technology B., 26, pp. 2316-2321, 2008

“Real-time Spatial Phase Locking for Vector-Scan Electron Beam Lithography”, Y. Yang and J. T. Hastings, Journal of Vacuum Science & Technology B., 25, pp. 2072-2076 (2007)